The Silent Revolution: Replacing Forever Chemicals in Our Smartphones and Computers

How the semiconductor industry is eliminating PFAS from photolithography while maintaining technological progress

Semiconductor Sustainability Innovation

The Invisible Ingredients in Our Digital World

Imagine that the smartphone in your pocket or the computer on your desk contains some of the same chemicals used in non-stick frypans and waterproof jackets. These substances—known as PFAS (Per- and Polyfluoroalkyl Substances)—have become the invisible workhorses of the digital age, playing a crucial role in manufacturing the microscopic circuits that power our modern devices.

4,000+

Different PFAS compounds in use worldwide

2030

Industry target for comprehensive PFAS-free solutions

What Are PFAS and Why Are They Everywhere in Semiconductors?

PFAS represent a class of over 4,000 human-made chemicals characterized by their strong carbon-fluorine bonds—one of the strongest connections in nature. This molecular superpower makes these chemicals remarkably persistent, giving them the "forever chemical" designation that has sparked environmental concerns worldwide 6 .

"The carbon-fluorine bond is one of the strongest in organic chemistry, which gives PFAS both their valuable properties and their environmental persistence."
PFAS in Semiconductor Applications
  • Acid generation efficiency 1
  • Hydrophobic properties 1 8
  • Chemical stability
  • Uniform coating 8

The Great Substitute Hunt: Industry Progress and Strategies

Organization Innovation Key Achievement Application
Fujifilm PFAS-free negative ArF immersion resist High-yield 28nm metal wiring formation ArF immersion lithography 1
Central Glass PFAS-free photoacid generator & immersion barrier polymer 95% light transmittance in barrier layer 193nm immersion lithography 2
Merck Comprehensive fluorine-free platform Improved swing reduction with fluorine-free TARC Multiple lithography processes 2 7
Imec PFAS rating system for photoresists Standardized PFAS content benchmarking EUV & DUV lithography 8
Chemical Substitution

New PFAS-free chemical compounds developed through molecular modeling and synthesis optimization 2 4 .

Process Innovation

Leveraging expertise in negative development processes using high-purity organic solvents 1 .

Platform Replacement

Comprehensive fluorine-free solutions rather than piecemeal replacements 2 .

Inside the Breakthrough: Testing PFAS-Free Photoresists

Performance Comparison
Environmental Impact
The research demonstrated that the PFAS-free resist could achieve high yields in forming 28nm metal wiring patterns, with performance metrics comparable to conventional PFAS-containing materials 1 .

The Scientist's Toolkit: Essential Materials for PFAS-Free Lithography Research

Research Reagents
  • PFAS-free Photoacid Generators Central Glass 2
  • Alternative Polymer Platforms Fujifilm 1
  • Fluorine-free TARC Merck 2
  • Hydrophobic Additives Alternative 1
  • Metal-Oxide Resists Tin oxide 8
Analytical Equipment
PFAS Content Measurement

Specialized equipment for quantifying PFAS in formulations

Pattern Characterization

Tools for evaluating resolution and defectivity

PFAS Rating System

Standardized benchmarking developed by imec 8

The Road Ahead: Challenges and Future Directions

Technical Challenges
Current: 28nm 1
Limited without PFAS 8
Industry Timeline
2024

PFAS-free resists for 28nm node demonstrated 1

2025

Expansion to additional lithography materials

2030

Comprehensive fluorine-free solutions target 7

Industry Commitment

"Our ambition is to offer fluorine-free replacement materials for all of our photolithography products by 2030" 7

- Merck Representative

A Sustainable Future for Digital Technology

The quiet revolution to eliminate PFAS from semiconductor manufacturing represents one of the most significant materials science challenges the industry has faced. What makes this effort remarkable is that it requires reengineering the very foundations of chip manufacturing while maintaining the relentless pace of technological progress that we've come to expect.

Environmental Responsibility

Reducing persistent chemical pollution while advancing technology

Technical Excellence

Maintaining performance while eliminating PFAS dependencies

Industry Collaboration

Material suppliers, manufacturers and research institutions working together

References